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Sunday, 05 Jan 2014

NikkoIA extends its organic imaging technology to X-Rays and CMOS substrates

NikkoIA’s technology consists in depositing thin films of photosensitive organic materials onto active or passive reading substrates

24 Apr 2013 | Editor

NikkoIA announces the production of several innovative organic image sensors that shows the potential of its technology, and validates the technology building blocks that can be immediately implemented to build its product lines.

NikkoIA’s technology consists in depositing thin films of photosensitive organic materials onto active or passive reading substrates. Current products are mainly based on TFT backplanes on glass, with a sensitivity optimised in the visible and/or 700/900nm spectrum range. The first evaluation cameras based on these sensors have already been shipped to the company customers.

NikkoIA announces the application of its organic imaging technology to two new product families:

  • X-ray sensitive image sensors, based on 256×256, 98µm-pixels organic image sensors, coupled with a CsI scintillator optimized for 70-90keV energy
  • VGA CMOS sensors with 15µm-pixels based on organic photodiodes and CMOS pixel arrays

Alain Jutant, President of NikkoIA, said, "The extension of the sensitivity to the X-rays range and the application of NikkoIA’s technology to various types of substrates (TFT or CMOS) enables, in the very short term, the production of large area visible, IR or X-rays image sensors at an extremely competitive cost structure compared to existing technologies, as well as the production of CMOS image sensors sensitive in the infrared beyond the cut-off wavelength of the silicon" Alain added, "These milestones reinforce our technology potential and validate our development strategy. They represent significant achievements that can now be implemented in products dedicated to our target markets"

   


About NikkoIA

NikkoIA is focused on the design, manufacture and selling of photodetectors and multi-spectral image sensors in the visible and near inrared spectrum (0.4 – 3µm), based on thin film semiconductor technologies.

NikkoIA takes advantage of an innovative technology to produce photodetectors and image sensors which demonstrate multiple benefits over current solutions. It enables the development of more intuitive and less invasive products and solutions in the medical, security and user interfaces markets.

This technology has been developed and patented by Siemens Corporate Technology. NikkoIA SAS and Siemens AG have signed a worldwide and exclusive license agreement for this technology on an extensive patents portfolio, either already granted or in the process of being so. This agreement is completed by a transfer of technology and know-how from Siemens AG to NikkoIA SAS to speed up the industrialisation phase.

NikkoIA is based in Grenoble, France, at the heart of a rich environment in electronics, semiconductor and imaging competencies and a world-renowned infrared industry. It will set up a production facility at this location. The company was founded in May 2011.

Source: NikkoIA


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