FujiFilm Corp and imec have demonstrated full-colour OLED by using their jointly-developed photo-resist technology for organic semiconductors, a technology that enables sub-micron patterning. The companies believe this is a breakthrough result that paves the way to produce high-resolution and large area OLED displays using a novel and cost-competitive manufacturing method
The research is built on earlier conducted by FujiFilm and imec who in 2013 jointly developed photo-resist technology for organic semiconductors that enables sub-micron patterning without damaging the organic semiconductor materials, based on photo-lithography capable of high-resolution patterning on large substrates.
In the latest achievement, Fujifilm and imec produced full-colour OLEDs with the photo-resist technology for organic semiconductors and successfully verified their performance. Red, green and blue organic materials were patterned, each in the sub-pixel pitch of 20μm, to create full-colour OLEDs.
An OLED array of 40 x 40 dots at a resolution of 640ppi was realized and illuminated with UV rays to confirm that red, green and blue dots separately emitted light. The emission of red, green and blue lights was also confirmed in a test involving the application of voltage rather than illumination, confirming its correct performance.
According to the announcement these results open new opportunities such as:
- using the novel photo-lithography in a multiple patterning process
- creating an OLED array that adds a fourth colour to red, green and blue,
- developing new sensors that integrate OLED with organic photodetector
A key aspect of this manufacturing process is that there is no need for additional capital investment since an existing i-line exposure system can be used for the new technology.
According to the announcement the research result is to be presented at the SID Display Week.
